China has built a prototype EUV (extreme ultraviolent) lithography machine in a high-security laboratory in Shenzhen. They had a semiconductor Manhattan Project”. The prototype was completed in early 2025 and is now undergoing testing. It occupies nearly an entire factory floor and was assembled using reverse-engineered components. Ramp-up timeline Functional for chip production around 2028. ...

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Link :
https://www.nextbigfuture.com/2025/12/china-will-close-the-semiconductor-gap-after-euv-lithography-breakthrough.html